A Tale of Three Trends: Mask Making Technologies in the Era of Curvilinear, ML and GPU

2024-10-10T21:27:17.000-0400

Summary

This is the invited talk presented by Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.


Details

See the attachment above for the presentation. 

KB Article ID# KB000154557_EN_US

Contents

SummaryDetails

Associated Components