Calibre A Tale of Three Trends: Mask Making Technologies in the Era of Curvilinear, ML and GPU

2024-10-10T17:27:17.000-0400
Computational Lithography

Summary

This is the invited talk presented by Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.

Details

See the attachment above for the presentation. 

KB Article ID# KB000154557_EN_US

Contents

SummaryDetails

Associated Components

Calibre pxOPC Calibre RET/OPC