Calibre Contour metrology for process matching and OPC qualification with machine learning-based site selection

2024-03-18T12:29:10.000-0400
Computational Lithography Fab Solutions

Summary

This is the paper jointly presented by GLOBALFOUNDRIES and Siemens EDA at SPIE Advanced Lithography Conference 2024.

Details

See the attachment above for the presentation.

KB Article ID# KB000130569_EN_US

Contents

SummaryDetails

Associated Components

Calibre RET/OPC