Calibre An artificial intelligence machine leaning (AI/ML) approach with cross-technology node learning for multi-layer process defect predictions

2024-03-18T12:05:27.000-0400

Fab Solutions

Summary

This is the invited paper jointly presented by AMD and Siemens EDA at SPIE Advanced Lithography Conference 2024.

Attachments:

See the attachment above for the presentation.

Calibre SONR