Calibre Monotonic Machine Learning for Retargeting Layer Generation by Leveraging Contour-Based Metrology

2024-10-10T17:31:24.000-0400
Computational Lithography

Summary

This is the paper jointly presented by IMEC and Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.

Details

See the attachment above for the presentation. 

KB Article ID# KB000154558_EN_US

Contents

SummaryDetails

Associated Components

Calibre RET/OPC