Calibre A method to study the curvature limits of a mask process using a calibrated MPC model

2024-10-10T21:22:06.000-0400

Curvilinear Solutions

Summary

This is the paper presented by Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.

Attachments:

See the attachment above for the presentation.

Calibre nmCLMPC