Calibre Sufficient Machine Learning based pattern classification for freeform designs

2024-10-10T21:11:11.000-0400
Computational Lithography

Summary

This is the paper presented by Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.


Details

Please see the attachment above for the presentation.  

KB Article ID# KB000154554_EN_US

Contents

SummaryDetails

Associated Components

Calibre OPCverify