This is the invited paper jointly presented by SK hynix and Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.
| Attachments: | Poster_ADC_of_EUV_Masks_using_DUV_Optics_-_BACUS_24.pdf (941.35 KB) Manuscript_ADC_of_EUV_Masks_using_DUV_Optics_-_BACUS_24.pdf (846.87 KB) |
Please see the attachment above for the presentation.