Calibre OPC and Modeling Solution to Support 0.55NA EUV Stitching

2024-10-10T21:32:11.000-0400
Computational Lithography

Summary

This is the paper jointly presented by IMEC and Siemens EDA at SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY Conference 2024.

Details

See the attachment above for the presentation.

KB Article ID# KB000154552_EN_US

Contents

SummaryDetails

Associated Components

Calibre EUV Calibre nmOPC Calibre nmModelflow