Calibre
Mask Synthesist in the Wake of GPU and Machine Learning (ML)
2024-10-02T17:00:32.000-0400
Computational Lithography
Summary
Details
Attachments:
Mask_Synthesis_in_the_GPU_and_ML_-_Semicon-Taiwan-2024-Danping_Peng-Siemens-EDA-final_updated.pdf (2.02 MB)
This is the presentation by Dr. Danping Peng
at SEMICON TAIWAN 2024.
KB Article ID# KB000153866_EN_US
Contents
Summary
Details
Associated Components
Calibre pxOPC
Calibre RET/OPC