Calibre High NA EUV Single Patterning of Advanced Metal Logic Nodes: Inverse Lithography Techniques in Combination with Alternative Mask Absorbers

2024-06-25T21:55:19.000-0400
Computational Lithography

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This paper was jointly presented by IMEC and Siemens EDA at the European Mask and Lithography Conference (EMLC) 2024.

KB Article ID# KB000133355_EN_US

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Associated Components

Calibre RET/OPC Calibre EUV