Calibre Model-Based Determination of Optimum Segment Length of Piecewise Linear (PWL) Mask Shapes

2024-06-25T21:54:18.000-0400
Mask Data Preparation (MDP)

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This paper was jointly presented by IMS and Siemens EDA at the European Mask and Lithography Conference (EMLC) 2024.

KB Article ID# KB000133354_EN_US

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Calibre MDP