Calibre Low landing energy as an enabler for optimal contour based OPC modeling in the EUV era

2024-03-19T06:57:35.000-0400
Computational Lithography

Summary

This is the paper jointly presented by IMEC, AMAT, and Siemens EDA at SPIE Advanced Lithography Conference 2024.


Details

KB Article ID# KB000130591_EN_US

Contents

SummaryDetails

Associated Components

Calibre RET/OPC Calibre EUV Calibre pxSMO Calibre WORKbench Calibre nmModelflow