Calibre Machine learning (ML) based SEM contour extraction accelerated by GPU for etch modeling application

2024-03-18T11:50:04.000-0400
Resolution Enhancement Technology (RET)

Summary

This is the invited paper jointly presented by IMEC and Siemens EDA at SPIE Advanced Lithography Conference 2024.

Details

See the attachment above for the presentation. 

KB Article ID# KB000130564_EN_US

Contents

SummaryDetails

Associated Components

Calibre RET/OPC