The release highlights presentation includes an overview of new features and best practice recommendations in Calibre Semi-manufacturing solutions for the January 22, 2024 quarterly release.
| Attachments: | 2024Q1_CalibreSemi_ReleaseHighlights.pdf (826 KB) 2024Q1_CalibreSemi_ReleaseHighlights_Storyboard.pdf (3 MB) |
New features highlighted include:
Extended GPU acceleration support for CM1 model calibration and machine learning resist (N2R) and etch (N2E) model training.
• New VEB model default version 2 enables updated algorithm for improving etch modeling accuracy and performance.
• New Calibre OPCverify check to detect sharp turns in contours and best practice recommendations.
• New default settings in Calibre nmModelflow, Calibre RET MEMOPC, and Calibre SONR.
• New Calibre RET modeling best practices for high NA EUV and optical model usage with Calibre OPCpro.
See the attachment for the presentations.